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Research progress and new applications of nanoimprint lithography
WANG Mengcheng, WU Di, SHI Hongbing, SU Zhijuan, YANG Zhuoqing, ZANG Faheng
2026, 32(1): 013101. DOI: 10.3724/jfmd.2509063
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Advances in the application of atomic layer deposition in gas sensors
SONG Fayu, ZHANG Jingyuan, LI Weijin, TU Min
2026, 32(1): 012102. DOI: 10.3724/jfmd.2507043
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Research progress of chip-scale atomic vapor cells for atomic sensors
HOU Jianwei, ZANG Faheng, LI Dezhao, LI Tie, GUO Xiaojun, YANG Zhuoqing
2026, 32(1): 012103. DOI: 10.3724/jfmd.2503004
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Research status and development trend of area selective atomic layer deposition
WU Xiaorui, OUYANG Yi, SHI Jianjun, LU Xueqiang, ZUO Xueqin
2026, 32(1): 013104. DOI: 10.3724/jfmd.2507041
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Developments and applications of localized electrochemical deposition additive manufacturing
JIN Yifan, PENG Huiling, WEN Huimin
2026, 32(1): 013105. DOI: 10.3724/jfmd.2508055
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Research progresses on artificial neural network based on hafnium oxide
LIU Liu, CAO Weikang, YANG Shuliang, HU Yiqun, LI Qingxuan, LI Zhenhai
2026, 32(1): 012106. DOI: 10.3724/jfmd.2504018
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Studies on preparation and conductivity of Ru thin films deposited by atomic layer deposition
ZUO Xueqin, LU Chenzi, LU Xueqiang, BAO Zhihao, HUANG Gaoshan, MEI Yongfeng, SHI Jianjun
2026, 32(1): 011207. DOI: 10.3724/jfmd.2508050
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Studies on seam free gap fill process for STI based on 28 nm CMOS technology
LIU Cong, LI Huayao, ZHANG Huanhuan, LIU Huan
2026, 32(1): 013208. DOI: 10.3724/jfmd.2509061
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Investigation of TIS effect in the E-beam overlay measurement
ZHANG Yu, BIAN Yuyang
2026, 32(1): 013209. DOI: 10.3724/jfmd.2505029
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Studies on optimization method of chemical mechanical planarization models using grid window refinement strategies
ZHANG Yu, LIU Jianzhong, LIU Biqiu
2026, 32(1): 013210. DOI: 10.3724/jfmd.2509066
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Bioinspired vision realized with in-sensor computing devices based on two-dimensional MoS2
QIU Siqi, XIN Kaiyao, WEI Zhongming
2026, 32(1): 012311.
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Enhancing the luminous efficiency of optoelectronic devices through defect engineering
HUANG Sen
2026, 32(1): 012312.
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