Wang Li-dong, Wang Zhong-jian, Cheng Xin-hong, Wan Li. The characteristics of gate-source double field-plates for GaN HEMTJ. Journal of Functional Materials and Devices, 2014, 20(1): 7-12.
Citation: Wang Li-dong, Wang Zhong-jian, Cheng Xin-hong, Wan Li. The characteristics of gate-source double field-plates for GaN HEMTJ. Journal of Functional Materials and Devices, 2014, 20(1): 7-12.

The characteristics of gate-source double field-plates for GaN HEMT

  • Different gate-source field-plates of GaN HEMTs with p-GaN gate structure were compared and investigated using Synopsys? TCAD tool.The simulation results showed that a new electrical field was introduced at the end of source field-plate and the breakdown voltage of the double gate-source plates structure was improved to 1365 V.A new peak of electric filed was produced in the interval gate field-palte by interval gate and source field-plates structure,and the breakdown voltage was further improved to 1478V.The suppression of the electrical field in gate plate gap by souce field-plate was decreased in the gatesource both interval structure and the highest breakdown voltage 1546V was achieved.
  • loading

Catalog

    Turn off MathJax
    Article Contents

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return