Influence of the chemical bath deposition parameters on the utilization of precursors of CdS thin films
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Abstract
CdS thin films were prepared by using chemical bath deposition(CBD) method in aqueous solutions containing cadmium acetate,ammonium acetate,ammonia and thourea.An orthogonal experiment of six factors and five levels was designed to study the influence of the deposition parameters on the utilization of precursors of CdS thin films.The results indicated that the influence of the chemical bath deposition parameters on the utilization of precursors of the CdS films were all different.With increase in Cd(CH3COO)2 and SC(NH2)2 concentration,the utilization of its own decline,but the utilization of the other increase.The utilization of precursors with the increase of NH3·H2O concentration first decreased and then increased,with the increase of CH3COONH4 concentration first increased then decreased;first increased and then kept stable along with the increase of temperature,first kept stable then decreased and finally increased small along with the increase of stirring speed.The utilization of Cd(CH3COO)2 and SC(NH2)2 was high when Cd(CH3COO)2,SC(NH2)2,CH3COONH4 and NH3·H2O concentration was 2,14,30,400mM/L,temperature was 70℃,and stirring speed was 200r/min.
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