两步生长法制备准有序氮化镓纳米线
Oriented GaN nanowires prepared by Two-step growth method
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摘要: 利用金属有机物化学气相沉积(MOCVD)方法制备准有序氮化镓纳米线。以带有氮化镓外延层(0001)的蓝宝石(Al2O3)作为衬底,表面沉积镍金(Ni/Au)薄膜作为催化剂,三甲基镓(TMGa)和氨气(NH3)作为气体源由载气通入反应室,在高温条件下生长出GaN纳米线。实验结果表明,生长温度影响纳米线的表面形貌,在750℃可以生长出形貌较好的纳米线。催化剂层的厚度影响纳米线的生长模式和有序性。通过两步生长法,可以制备出较为有序的氮化镓纳米线。Abstract: Oriented GaN nanowires(NWs) were prepared by using metalorganic chemical vapor depositionon(MOCVD).The GaN(0001) coated sapphire is used as substrate with Ni/Au catalyst on it,Trimethylgallium(TMGa) and NH3 were used as sources,the nanowires were grown under high temperature.Experiment result shows that the morphology of the nanowires under the influence of growth temperature,good morphology nanowires can be grown at 750℃.The thickness of the catalyst affects the nanowire’s growth mechanism and the orientation.Oriented GaN nanowires can be prepared by Two-step growth method.
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