射频磁控溅射法制备Bi2O3薄膜的电致变色性能研究
Electrochromic properties of Bi2O3 thin films deposited by RF magnetron sputtering
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摘要: 采用射频磁控溅射技术在ITO导电玻璃上沉积了Bi2O3薄膜,利用X射线衍射仪、原子力显微镜、X射线光电子谱对薄膜的微结构、表面形貌、成分和价态进行了表征。分析表明在空气气氛中350℃热处理的Bi2O3薄膜具有四方结构,属β-Bi2O3,该薄膜在-1.8-+3V的直流电压驱动下具有在透明和暗棕色之间转换的电致变色性能,着色和漂白过程中均没有其他价态(+3价以外)的Bi生成。研究发现Bi2O3薄膜在400-800nm的可见光波段平均透射率调制幅度可达44%,550nm处着色系数为9.6cm2/C,该材料具有优良的电致变色性能。Abstract: Bismuth oxide thin films were prepared on ITO glass substrate by radio frequency(RF) magnetron sputtering.X-ray diffraction、atomic force microscopy and X-ray photoelectron spectroscopy were employed to characterize the microstructure、surface morphology、composition and valence state of the thin films.It is indicated that the crystal structure of the thin film annealed at 350℃in air is tetragonal phase and the thin film shows a clear electrochromic change between transparent and dark brown on switching voltage between -1.8V and +3.0V.There are no other valence states(except the trivalent state) for bismuth during the process of coloration and decoloration,which is confirmed by the results of XPS analysis.The measurement of UV-Vis spectrophotometer demonstrates that the average optical modulation in the wavelength range from 400 to 800nm can reach 44%.The electrochromic efficiency at 550nm is 9.6cm~2/C proved by cyclic voltammetry.The results show that the Bi2O3 thin films possess well electrochromic property.
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