集成电路铝制程刻蚀后清洗液技术原理与性能提升

The Theory and Improved Performance of Post Etch Polymer Remover

  • 摘要: 集成电路材料是集成电路产业发展的基础, 集成电路材料国产化是我国集成电路产业发展的重要保障。其中湿化学品为集成电路材料的关键材料之一, 新阳作为国产集成电路材料中的代表型企业, 成功将铝制程刻蚀后清洗液SYS9070推进至国内领先制造商实现量产。本文主要介绍了铝制程刻蚀后清洗液的工艺原理、技术难点及产品工艺表现, 最后总结了攻克该技术对中国集成电路产业链的进一步升级和完善的意义。

     

    Abstract: Semiconductor materials are the cornerstone of the IC industry, and localization of semiconductor materials is the key to ensuring the fast and healthy growth for the IC industry in China. And wet chemicals are critical to the semiconductor industry. As a leading domestic wet chemical provider, Sinyang has successfully provided post etch polymer remover SYS9070 for leading semiconductor manufacture company in mass production. This article introduces principles of the manufacturing process, product performance of post etch polymer remover SYS9070, and summarizes the significance of overcoming the technological challenges.

     

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