短沟道n-MOSFET亚阈值电流模拟计算分析

Simulation of subthreshold current for short-channel n-MOSFET

  • 摘要: 本文基于亚阈值电流和表面势模型的基础上,采用商用器件模拟软件,建立了短沟道n-MOSFET的结构和物理模型,对器件的亚阈值电流进行了2-D数值模拟。计算了不同沟道掺杂浓度、氧化层厚度以及沟道长度对器件亚阈值电流的影响,并对模拟结果进行了系统的理论分析,数值模拟结果和解析模型能够在亚阈值区很好的吻合。

     

    Abstract: In this paper,based on the subthreshold current and surface potential model,setting up the structure and physics model of short-channel n-MOSFET by using commercial simulation software,the subthreshold current of device are simulated via 2-D numerical simulation.The channel doping concentration、oxide thickness of gate and the length of channel dependence of the subthreshold current are calculated,the simulation results are investigated through theoretical anglicizing,good agreement is obtained between the calculated model and the simulated results.

     

/

返回文章
返回