Abstract: The SiO₂ films were deposited on silicon substrate by Flame Hydrolysis Deposition （FHD）. Then, the films were consolidated in electric furnaces at 1380℃ to make silica glass. The glass films（10-30μm thick） were uniform, glassy and transparent, which could be used to fabricate both single-mode and multi-mode arrayed waveguide grating. Finally, the silica films were analyzed by SEM, XRD, etc.