具有可见光活性的TiO2薄膜的制备及光催化性能

Preparation of TiO2 film with visible-light activity and photocatalytic properties

  • 摘要: 运用磁控溅射技术在浸渍-提拉法制得的TiO2薄膜上溅射三氧化钨层得到光催化薄膜。采用SEM、XRD、AES、UV-vis漫反射光谱等方法表征催化剂薄膜的厚度、晶相结构、化学元素组成及光吸收性能。以甲基橙的光催化降解为反应模型,高压汞灯为光源,溅射有三氧化钨薄膜的光催化活性低于纯TiO2薄膜;滤过紫外光后,溅射有三氧化钨的薄膜光催化活性明显高于纯TiO2薄膜。本实验提供了一种制备高可见光活性的TiO2薄膜的方法。

     

    Abstract: TiO2 films made from dip-coating system were modified by the magnetron sputtering of WO3.The thickness, phase, chemical composition and the optical absorption of the films were characterized by means of SEM, XRD, AES, UV-vis reflectance spectra techniques. With irradiation of high-pressure mercury lamp, the photo-catalytic behavior of film magnetron sputtered with WO3 is weakened in the degradation of orange methyl, while with the addition of UV light filter, the photo-catalytic behavior is enhanced. A preparation method of TiO2 film with high visible light activity is proposed.

     

/

返回文章
返回