激光溅射沉积后硒化制备CIGS薄膜

Preparation of CIGS thin films by the pulsed laser deposition method and post-selenization

  • 摘要: 采用脉冲激光溅射沉积法(PLD)制备了Cu-In-Ga双层预制膜,通过固态源硒化后热处理的方法获得了CuIn1-xGaxSe2(CIGS)薄膜,研究制备预制膜的工艺参数以及热处理温度对CIGS薄膜特性的影响。采用台阶仪、SEM、EDS、XRD和紫外分光光度计研究了薄膜的厚度、表面形貌、成分、物相结构以及光学带隙。得到了制备具有较好光学性能CIGS薄膜的优化条件为:Cu、In、Ga的原子含量比为nCu/(nIn+nGa)=0.98,nGa/(nIn+nGa)=0.28,硒化温度250℃,硒化时间60min,热处理温度为550℃,在此优化条件下得到的薄膜光学带隙为1.43eV,XRD表明CIGS薄膜是单一黄铜矿薄膜。

     

    Abstract: The Cu-In-Ga bilayer precursors were fabricated by pulsed laser deposition(PLD) method and the CuIn1-xGaxSe2(CIGS) thin films were formed through selenization and heat-treatment of Se vapor.The influence of heat treatment temperature on the properties of CIGS thin film was discussed.We also studied the surface morphology,composition,phase structure and optical band gap with stylus profiler、SEM、EDS、XRD and UV-Vis absorption spectroscopy.It is found that the optimized fabrication parameters of CIGS thin films with good optical properties are that the ratio of nCu/(nIn+nGa)=0.98,nCu/(nIn+nGa)=0.28,the time of selenization is 60min,the temperature of selenization is 250 ℃,and the heat-treatment temperature is 550℃.The optical band gap of the CIGS film prepared under the optional conditions is 1.43eV,X-ray diffraction results indicate that the CIGS thin films are well crystallized,and there is single phase and chalcopyrite structure in the film.

     

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