掺杂SnS薄膜的制备及电学性能

Electrical properties of doped SnS thin films prepared by vacuum evaporation

  • 摘要: 硫化锡(SnS)具有很高的光吸收系数和合适的禁带宽度,又无毒性,因此在太阳电池等光电器件中具有潜在应用价值。本文用真空蒸发法制备掺杂的SnS薄膜,掺杂源有Sb、Sb2O3、Se、Te、In、In2O3、Se和In2O3的混合物。对各种掺杂SnS薄膜的厚度、电流-电压(Ⅰ—Ⅴ)特性等进行了表征,并计算了其电阻率和光电导与暗电导的比值(Gphoto/Gdark)。结果表明较有效的掺杂源是Sb,Sb掺杂的薄膜电阻率比纯薄膜的电阻率降低四个数量级,Gphoto/Gdark增加约一倍。同时,研究了Sb掺杂量对SnS薄膜电学性能的影响,表明Sb的最佳掺入量约为1.3wt%~1.5wt%。

     

    Abstract: Tin sulfide(SnS)has received much attention because of its high absorption coefficient,suitable band-gap and little toxicity.The resistivity of pure-SnS thin film deposited by vacuum evaporation is too high to make solar cell.In order to solve this problem,doped-SnS thin films were fabricated.Sb, Sb2O3,Se,Te,In,In2O3,Se and In2O3 were used as dopant sources.The thickness and conductance of various doped-SnS thin films were measured,and then the resistivities and the ratio of photo-conductivity to dark-conductivity(Gphoto/Gdark)of these films were calculated.From the experimental results,Sb is the best dopant source.The resistivity of Sb doped-SnS thin film is reduced by four orders of magnitude and the value of Gphoto/Gdarkis double.In addition,the influence of Sb doping content on the electrical properties of doped-SnS thin films was also investigated,and the optimum doping content of Sb is 1.3%~1.5% in weight.

     

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