光导型GaN/Si探测器的研制
Fabrication of GaN/Si photoconductive detectors
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摘要: 采用MOCVD技术在Si(111)衬底上生长GaN薄膜,以此材料制备成光导型Si基GaN紫外探测器。探测器的光谱响应表明,在紫外波段250-360nm有近于平坦的光电流响应,363nm附近有陡峭的截止边,357nm波长处5V偏压下的响应度高达6.9A/W。响应度与偏压的变化关系表明,4V以前为线性增加,5V后达到饱和。Abstract: Using the GaN epilayer which was grown on Si(111) by MOCVD to fabricate GaN ultraviolet detectors is reported in this paper. The detectors exhibit a high and flat responsivity in UV region with the wavelength from 250nm to 360nm and a sharp cut-off at 363nm. At 357nm, a maximum responsivity of 6.9A/W is achieved under 5V bias. The relationship between the responsivity and the bias voltage shows that the responsivity saturates when the bias voltage reaches 5V.
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