发射极δ掺杂的InGaAs/InP DHBT的特性分析

Analysis of the characteristics of DHBT with a δ-doping sheet in the emitter and composite collector

  • 摘要: 设计了一种新结构的InGaAs/InP双异质结晶体管(DHBT),其中发射结采用δ掺杂和阻挡层结构,集电极采用N+掺杂复合结结构。考虑隧穿作用和发射结空间电荷区复合电流的影响,计算了δ掺杂浓度和N+、n-层厚度等参数变化对InGaAs/InP DHBT电流、I-V输出特性、电流增益的影响,计算结果表明,随着这些参数值增大,InGaAs/InP DHBT输出特性逐渐改善。当δ掺杂浓度大于2×1012cm-3时,电流增益趋于饱和。

     

    Abstract: A novel InGaAs/InP DHBT with a δ-doping sheet in the emitter and a N+ doping composite collector was designed. To analyze the characteristics of InGaAs/IhP DHBT, an analytical model is developed. Based on this model, the I-V characteristic, currents, and current gain are calculated. It is found that the I-V characteristics is improved with increasing the thickness of N+ layer and the doping concentration of N+ layer. When the δ doping concentration is greater than 2 × 1012cm-3, current gain reaches a saturation value.

     

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