溅射制备Pt<sub>1-<italic>x</italic></sub>Co<sub><italic>x</italic></sub>（x=0.2～0.4）合金膜的基本光学和磁光常数

溅射制备Pt_1-xCo_x（x=0.2～0.4）合金膜的基本光学和磁光常数

摘要: 在光子能量为1.5eV～4.8eV的范围内，测量了用溅射合金靶方法制备的易磁化方向垂直于膜面的Pt_1-xCo_x（x=0.2～0.4）合金膜的光学常数和磁光常数。该合金膜的光学常数对成份极不敏感。磁光常数随Co成份的增加而增加。克尔转角在光子能量为4.2eV附近的峰值随Co成份的增大可用费米面附近d电子轨道态密度和Pt 5d电子极化的增大来解释。本文还讨论了Pt_1-xCo_x合金膜的本征和潜在品质因子。

Abstract: The optical and magneto-optical constants of Pt_1-xCo_x (x=0.2~0.4） alloy films with perpendicular magnetic anisotropy prepared by sputtering alloy target were measured at photon energy 1.5~4.8eV. The optical constants of the alloy films were extremely insensitive to its component. Their magneto-optical constants increased with the Co content. The increase of the Kerr rotation peak at 4.2eV with the content of Co can be attributed to the increases of the d band state density of Co near Fermi level and the polarization of Pt 5d electrons. The potential figure of merit of the alloy films was also discussed.