退火温度对TiO2: Eu3+薄膜光致发光性能的影响

Influence of annealing temperature on the photoluminescence property of TiO2: Eu3+ thin films

  • 摘要: 采用溶胶一凝胶法在普通载玻片上制备出稀土Eu3+掺杂的TiO2薄膜, 研究了退火温度对TiO2: Eu3+薄膜的光致发光性能的影响, 以及对TiO2晶体结构的影响。结果表明: 随着退火温度的升高, TiO2: Eu3+薄膜光致发光光谱(Photoluminescence Spectroscopy, PL谱)增强, 并在550 ℃退火时达到最强;XRD显示, 在550 ℃退火时TiO2的(101)衍射峰强度最强, 且取向性最好。

     

    Abstract: TiO2 thin films doped with Eu3+ were synthesized by the sol-gel process. The influence of annealing temperature on the physical properties was analyzed using different characterization techniques such as X-ray diffraction, SEM analysis and photoluminescence. The photoluminescence emission spectra showed that the PL intensity of the TiO2: Eu3+ films increased with the annealing temperature rising, and reached the maximum at 550 ℃. The X-ray diffraction revealed that the (101) diffraction peaks of TiO2 were very strong, and have the best orientation at 550 ℃.

     

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