脉冲阳极氧化工艺制作GaAs/AlGaAs宽条形半导体激光器
GaAs/AlGaAs BA semiconductor lasers fabricated with pulsed anodic oxidation process
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摘要: 研究了脉冲阳极氧化工艺的特性,并利用脉冲阳极氧化工艺制作出激射波长为776nm的宽条形半导体激光器,器件阈值电流为0.35A,斜率效率为1.12W/A,与常规工艺制作的器件相比阈值电流降低了22%,斜率效率提高了18%。Abstract: The characteristic of pulsed anodic oxidation process was investigated in this paper.Broad area semiconductor lasers with wavelength of 776nm were fabricated with pulsed anodic oxidation process.The threshold current of the device was 0.35A with the slope efficiency of 1.12W/A,compared to the devices fabricated with conventional fabrication process,the threshold current of the devices reduced by 22% and the slope efficiency increased by 18%.
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