Abstract: Gradient magnetic filed was introduced into the discharge space in sputtering procedure.By such arrangement,it became easier to sputter magnetic target (Fe) that led to the deposition of magnetic films.Meanwhile,some properties of the magnetic film change were compared with the case without applied magnetic field.Such variations also appeared in sputtering non-magnetic targets,such as Al and Cu.Comparison was made between some parameters for the case employing magnetic field and for the case without the target,including the variations of self-bias voltage,of the crystallization and the magnetic properties of the films.The distribution gradient of magnetic field in the discharge space is considered as the radical reason of such variations mentioned above.