应用于微反射镜制作的光亮镀镍工艺

Bright Nickel Plating for the Fabrication of Micromirror

  • 摘要: 研究了一种可用于微反射镜制作的光亮镀镍工艺。分析了微小面积电镀时出现边缘效应的问题,提出了增加牺牲结构的方法提高沉积速率并降低电镀边缘效应。通过脉冲微电镀实验,讨论了电流对电镀边缘效应的影响,同时分析了影响镀层表面质量的因素,得出了一组具有参考价值的电镀参数,电镀出了长620μm、宽500μm、厚2μm的微反射镜表面结构,经测量计算,该条件下,镍的生长速度约为0.1μm/m in,表面平均粗糙度约为4.376nm。

     

    Abstract: This paper investigates a bright nickel plating technique for the fabrication of micromirror.The edge effect problem of the electroplating is analysed.A sacrifice structure was applied to increase the speed of electroplating and reduce the edge effect.Through pulse micro-electroplating experiments,It was found that the edge effect could be controlled by varying the current density.At the same time,factors that affect the structure surface quality of electroplating were discussed;Some valuable experimental parameters were obtained.A smooth structure with the size of 625×500×2 μm3 was electroplated,which can be used to fabricate micromirror.the growth rate nickel is about 0.1μm/min,The average surface roughness is about 4.376nm.

     

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