改性SU8光刻胶的光学特性及其工艺
Optical properties and process of the diluted SU8 resist
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摘要: 通过改变SU-8光刻胶中PAG浓度获得含不同PAG浓度的各种改性SU-8光刻胶,在对其光学性能以及最小曝光剂量的测定基础上研究改性SU-8光刻胶的光刻工艺,借助于改性SU-8光刻胶的合理设计以及背面曝光和正面曝光的结合应用提高多元材料复杂结构的集成制造能力。Abstract: Kinds of diluted SU8 resists are obtained by adjusting its PAG concentration.On the base of the measurement of optical performance and the minimal exposure dose,we study its photolithography process.With the reasonable design of diluted SU8 resist and the adoption of front and back exposure,we can improve the ability of integrate manufacture with complex structure.
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