退火温度及存储对辐照后VDMOS参数恢复特性影响

Recovery influence of annealing temperature and storage to vdmos after irradiation

  • 摘要: 对VDMOS各样品进行总剂量3KGy(Si)的γ射线辐照试验,对比了试验前后的阈值电压、亚阈值电流、跨导及导通电阻的变化情况,并从理论上分析了参数退化的原因。然后研究了辐照后VDMOS各样品在室温下长时间存储及退火后参数的变化情况,并做出了解释。试验结果表明:γ射线辐照使得各样品参数有不同程度的退化,其中,A类样品的阈值电压平均退化4.5V,B类样品平均退化1.74V;亚阈值电流增长大于2个数量级;跨导平均增长0.7S;导通电阻平均退化0.052Ω。在室温下长时间存储后样品参数有小幅度的恢复。高温退火使得样品各参数基本恢复至辐照前水平。

     

    Abstract: Total dose 3KGy(Si) is supposed to the VDMOS specimens,and the degradation of VTH,gm,IDsub and Ron after experiment are compared with the initial value before experiment.The paper studied the variation of the parameter after the long term room temperature storing and after the annealing,then the explanation is given.Experiment results showed that,each parameter of the specimens was found degradation after the γ-ray irradiation.The average degradation of VTH of A Class Sample is 4.5V,and the average degradation of VTH of B Class Sample is 1.74V;The Growth of IDsub is over two orders of magnitude,the average growth of gm is 0.7S and the average degradation of Ron is 0.052Ω.When the specimens were storing at room temperature for a long time,each parameter got partial recovery.And after high temperature annealing the parameters can get recovery to the level before irradiation.

     

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