非均匀退磁场对NiFe薄膜AMR元件性能的影响

Effect of non-uniform demagnetizing field on the anisotropic magnetoresistance of NiFe element

摘要: 采用磁控溅射制备了NiFe各向异性磁电阻(AMR)薄膜,经过光学曝光及离子刻蚀将NiFe薄膜制成了宽度w=20μm、厚度t=20nm、长度l=2.5mm的AMR元件。测量了NiFe元件的磁电阻效应。考虑沿宽度方向退磁场的非均匀性,计算了磁电阻比率。结果表明,理论和实验符合。

Abstract: NiFe thin films were prepared with magnetron sputtering.By using optical lithography and ion etching,NiFe films were patterned into AMR element with width of 20μm,thickness of 20nm,and length of 2.5mm.The Anisotropic magnetoresistance of NiFe element were measured.Taking into account the non-uniformity of demagnetizing field along the width of AMR element,Magnetoresistance ratio have been numerically calculated.The results have shown that theoretical results are in good agreement with experiment.