Abstract:
Deposition of superconducting films on flexible metal substrates by MOCVD is one of the potential manufacture methods in practical use. The key problem therein is the preparation of textured buffer layers by a proper fast method. In this paper, the deposition of YSZ buffer layer with a thickness of about 0.5
μm on Ni based alloy substrates by the use of Y (dpm)
3 and Zr (dpm)
4 organic sources was reported. The influences of the partial pressure of oxygen and the deposition temperatures on the crystallinity of YSZ as well as its texture were studied. It was shown that when the vacuum of the growth chamber was kept at ~130Pa and its oxygen partial pressure kept at ~20Pa, the deposited polycrystalline YSZ film has a strong (111) texture. But when oxygen partial pressure was increased to 50~100Pa, the texture changed to (100). It was also shown that the quality of YSZ film is dependent on the substrate temperature, lower (< 700℃) temperature would lead to poor quality.