锰掺杂对PbZr0.5Ti0.5O3铁电薄膜电学性能的影响

Effect of Mn doping on the electrical properties of PbZr0.5Ti0.5O3 ferroelectric thin film

  • 摘要: 采用Sol-gel方法在生长有LNO3的Si(100)衬底上制备了掺Mn的PbZr0.5Ti0.5O3铁电薄膜(PMZT)。PMZT薄膜具有优良的铁电性。在外加电场下观察到了非对称剩余极化翻转行为。这种剩余极化的翻转不对称随着锰掺杂浓度的增加而变大,从而表明极化过程中产生的内建偏压电场是由Mn的掺杂引起的。当薄膜厚度保持不变时候,PMZT薄膜的剩余极化(Pr)和平均矫顽电场(Ec)随着锰掺杂浓度的增大而减小。在低频下,PMZT薄膜的介电常数随着锰的掺杂浓度的增加而减小。瞬时电流随着时间的呈指数衰减,最后到达饱和的稳态值。样品的漏电流密度随着电压的增加而近似地线性增加,显示出欧姆特性。在相同电压下,漏电流密度随着Mn掺杂浓度的增加而增加。

     

    Abstract: Manganese-doped lead zirconate titanate Pb(Zr0.5Ti0.5)1-xMnxO3(PMZT) with x=0, 0.01, 0.02, 0.03 film were prepared by using sol-gel processing techniques on LaNiO3/Si(100) substrates. Pt/ Pb(Zr0.5Ti0.5)1-xMnxO3(PMZT)/LaNiO3 capacitor were fabricated. It shows excellent ferroelectricity. Asymmetric switching behavior of the polarization was observed under the external applied electric field. The asymmetric switching behavior of the polarization becomes larger with the increasing of Mn dopant concentration. The remnant polarization and coercive field decrease with the Mn content increasing. The dielectric constant of PMZT films decreases with the doping Mn decrease at low frequency. The leakage current density increases approximately linearly with voltage. The samples display nearly ohmic behavior. The leakage current increases with the increasing of Mn dopant under the same stress voltage.

     

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