Abstract:
Lead Zirconate titanate Pb(Zr
0.53Ti
0.47)O
3 (PZT) thin films were deposited onto LNO/SiO
2/Si and Pt/Ti/SiO
2/Si substrates by sol-gel method. The effects of LNO bottom electrode on microstruc-ture and electrical properties of the PZT thin films were discussed. Highly (100) oriented PZT/LNOfilms have lower dielectric constant and polarization compared to the (111)/(100) oriented PZT/Ptfilms. Additionally, the PZT/LNO films are found to have fatigue and leakage current behaviors im-proved significantly. The normalized polarizations of the PZT/LNO films have no obvious change up to 10
10 switching cycles, decrease only 17%up to 10
12 switching cycles.