Pb(Zr0.52Ti0.48)O3铁电薄膜的脉冲准分子激光沉积和快速退火及其性质研究

RAPID THERMAL ANNEALING AND CHARACTERISTICS OF LASER ABLATED FERROELECTRIC Pb(Zr,Ti)O3 THIN FILMS

  • 摘要: 用ArF脉冲准分子激光在SOI和Pt/SOI衬底上沉积了Pb(Zr,Ti)O3铁电薄膜,并用快速退火进行热处理。X射线衍射、卢瑟辐背散射等分析表明:所结晶的薄膜是以(100)和(110)为主要取向的多晶膜,且结晶情况与热处理温度和时间密切相关;PZT薄膜呈现铁电性,其剩余极化Pr=15μc/cm2,矫顽电场Ec=50kV/cm;并且具有较高的介电常数和较高的电阻率。

     

    Abstract: Ferroelectric Pb(Zr,Ti)O3 thin films were prepared by pulsed excimer laser deposition on SOI (Si-on-Insulator) and Pt-coated SOI substrates. Rapid thermal annealing was performed to crystallize the thin films. Based on the analysis by X-ray diffraction, Rutherford backscattering spectroscopy and electrical properties measurements, the films were revealed of to be polycrystalline perovskite structure with mainly <100> and <110> orientations, have a high resistivity and dielectric constant. The PZT thin films on Pt/SOI showed a remanent polarization of 15μc/cm2 and a coercive field of 50kV/cm.

     

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