射频等离子体分子束外延GaN的极性研究

Influence of buffer layers on polarity of GaN by RF-plasma MBE

  • 摘要: 对采用射频等离子体分子束外延(RF-plasmaMBE)生长得到的GaN进行极性研究。由于镓极性(Ga-polar)比氮极性(N-polar)有更好的化学稳定性,通过比较RF-plasmaMBE生长得到的不同GaN样品对光辅助湿法刻蚀的稳定性,发现缓冲层生长条件对GaN外延层的极性有着重要影响:较高缓冲层生长温度得到的GaN外延层表现为N-polar,较低缓冲层生长温度得到的GaN外延层表现为Ga-polar。

     

    Abstract: The polarity of GaN grown by RF-plasma MBE was investigated at different growth temperatures of buffer layer. There are two types of polarities of wurtzite-GaN: Ga-polar and N-polar.The former has greater chemical stability than the latter. Compared with morphology from AFM of GaN samples etched by photo-assisted wet etching, it is found that the N-pol ar GaN is obtained at higher growth temperatures of buffer layer, while buffer layer grown at lower temperatures results in the Ga-polar.

     

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