溅射工艺对LaNiO<sub>3</sub>薄膜结构的影响

溅射工艺对LaNiO₃薄膜结构的影响

摘要: 采用射频磁控溅射法在Si(100)衬底上制备了LaNiO₃薄膜。通过原位加热或后续热处理使薄膜晶化。借助X-ray衍射分析、电感耦合等离子体发射光谱、原子力显微镜等手段研究了溅射工艺对薄膜显微结构的影响。实验结果表明,溅射时是否加热对薄膜的结晶取向影响很大,而氧分压则影响La/Ni比。衬底不加热时,通过后续热处理得到多晶的随机取向薄膜,而当溅射时原位加热300℃,则得到有明显(100)择优取向的薄膜。

Abstract: LaNiO₃ thin films were deposited by rf.sputtering on（100） Si.The thin films were crystallized by heating the substrate in situ,or by heating the as-deposited thin films in oxygen.The microstructure of the thin films was investigated by XRD,ICP,AFM.It was found that the orientation of LNO was very sensitive to the deposition temperature and La/Ni ratio was influenced by the oxygen pressure.Highly（100）-oriented LNO thin films were successfully prepared on Si（100） substrate when deposition temperature was 300℃.