ZnO/n-Si异质结的I-V、C-V特性研究

Study on ZnO/p-Si heterojunction by I-V and C-V characteristic

  • 摘要: 本文通过磁控溅射Al掺杂的ZnO陶瓷靶,在n-Si片上沉积n型电导的ZnO薄膜而制备的ZnO/n-Si异质结,并通过测试其光照下的I-V、C-V特性对其光电特性以及载流子输运特性与导电机理进行了研究。研究表明ZnO/n-Si异质结存在良好的整流特性与光电响应,可以广泛应用在光电探测和太阳能电池等领域。由于在ZnO/n-Si异质结界面处的导带补偿与价带补偿相差太大的缘故,在正向电压超过0.8 V时,导电机理为空间电荷限制电流导电。同时研究表明ZnO/n-Si异质结界面存在大量界面态,可以通过减小界面态可以进一步提高其光电特性。

     

    Abstract: In this article,A type n conductance of ZnO thin film was deposited on the p-Si filim by magnetron sputtering Al doped ZnO ceramic target,and the ZnO/n-Si heterojunction was preparated.The photoelectric properties,charge carrier transport properties and conductive mechanism were studied by testing the I-V,C-V characteristics with illumination and without illumination.The results shows that there exists a good rectifying properties and photoelectric response for ZnO/n-Si heterojunctions,and can be widely used in photoelectric detection and fields of solar cells.As the conduction band and valence band offset in the ZnO/n-Si heterojunction is too big,the current transport mechanism is dominated by the space-charge limited current(SCLC) conduction at the forward voltage exceeds 0.8 V.The results suggest the existence of a large number of interface state in ZnO/n-Si heterojunction,and the interface states can be reduced and the photoelectric properties can be further improved.

     

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