应用于体声波谐振器的ZnO薄膜结构和电学特性
Structural and electrical characteristics of ZnO film for application in bulk acoustic wave resonator
-
摘要: 采用直流磁控溅射的方法制备了ZnO压电薄膜,并在双面抛光的熔融石英基片上制备了高次谐波体声波谐振器。X射线衍射结果显示ZnO压电薄膜C轴择优取向明显,衍射峰半高宽为0.1624°,显示出较好的结晶质量;扫描电镜分析观察到ZnO垂直于基片表面的柱形晶粒结构和较平滑的薄膜表面。体声波器件的电学测试结果显示器件具有很好的多模谐振特性,说明ZnO压电薄膜很好地激发出了厚度方向的纵声波,可应用于体声波器件和声表面波器件中。另外采用间接的方法得到ZnO压电薄膜在870MHz时的介电常数约为5.24,介电损耗因子为1.07,进一步减小介电损耗因子,可以提高器件的Q值。Abstract: Piezoelectric zinc oxide(ZnO) thin film was deposited by DC reactive magnetron sputtering and high overtone bulk acoustic resonator was fabricated on double-side polished fused quartz substrate.X-ray diffraction measurement shows that ZnO film is highly C-axis-oriented with a full width at half maximum(FWHM) 0.1624° which means good crystal quality.Scanning electron microscopy(SEM) shows the strong columnar structure oriented perpendicular to the smooth surface.The electrical characteristics of high overtone bulk acoustic resonator show multi-mode resonances,which mean that predominant longitudinal wave is excited by ZnO film.So the ZnO film could be used for applications of bulk acoustic wave devices and surface acoustic wave devices.With an indirect method,dielectric constant and dielectric loss factor of ZnO film at 870MHz were calculated to be about 5.24 and 1.07 respectively.With the dielectric loss factor further reduced,Q value of the BAW device would be much higher.
下载: