氮化镓基电子与光电子器件

GaN-based electronic and photoelectric devices

  • 摘要: GaN具有宽禁带、高击穿电压、异质结沟道中高峰值电子漂移速度和高薄层电子浓度等特点,是大功率和高温半导体器件的理想化合物半导体材料。宽禁带Ⅲ-Ⅴ族化合物半导体的性能和研究进展已经使大功率紫外光/蓝光/绿光光发射二极管走向商业市场,证明InGaAs/GaN/AlGaAs紫罗兰色异质结激光器能够在室温和脉冲或连续波条件下工作,是性能优越的光电器件的理想材料。本文综述了上述研究成果。

     

    Abstract: The group Ⅲ-nitride materials are ideal for high power and high temperature devices due to their large energy band-gap, high breakdown voltage, high peak electron velocity and high electron sheet density in channels when used in a heterostructure. Major developments in wide gap Ⅲ-Ⅴ nitride semiconductors have recently led to the commercial production of high-power UV/Blue/Green light-emitting diodes and to the demonstration of room-temperature violet laser light emission in InGaAs/GaN/AlGaAs-based heterostructures under pulsed and continues-wave operations. The group Ⅲ-nitride materials are also ideal for photoelectric devices. These results and discussion are described in this paper.

     

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