Abstract: Cu-Zr alloy films were deposited on TiN,TaN and ZrN diffusion barriers with co-sputtering technology that combined magnetron sputtering（MS）and ion beam sputtering（IBS）.The films were annealed at 400℃ for 1h in N₂ .It is found that after annealing,Zr in the film diffuses to the surface and the interface,and the surface morphology and particle size vary with different diffusion barriers.The films on ZrN diffusion barrier has the smallest particle size.The as-deposited Cu-Zr alloy films have a strong（111）texture and broaden peaks.After annealing,the Cu-Zr alloy films become less oriented.There appear（200）,（220）and（311）peaks,besides（111）peak and the integrated intensity ratio of（200）/（111）is different for different film/barrier system.