Abstract: For the hot-embossing lithography,imprinting stamp with long-life span,good anti-wear property and precise geometrical shape,is much expected for pushing forward the technology to industrial application.By analyzing existing disadvantages of current Si and SiO₂ imprinting stamps,this paper presents TiN coating/glass substrate system as the stamp material,in which the glass plates serves as substrate and the hard TiN coating is fabricated for the nano-patterns.For fabricating the stamp,first several microns TiN coatings are deposited on the glass by ion-beam deposition system.Then for TiN/glass system,focused ion beam etching system is used to fabricate a series of nano-patterns on the TiN coating.The primary hot-embossing imprinting results indicate good results for PMMA.Hereby it is believed that conventional hard coating TiN could be potentially a good choice for realizing the long-life imprinting and improving the life duration of the imprinting stamp greatly.