碲锌镉单晶片的退火方法
Annealing of Cd1-xZnxTe Wafers
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摘要: 探索了一种Cd1-xZnxTe(CZT)探测器晶片退火的新装置和新方法,该装置可以方便有效的对CZT单晶片进行同组分源退火研究。利用XRD、红外透射谱和晶体电阻率表征了采用该装置在富Cd的同组分CZT粉末源包裹下,选择适宜的退火温度和时间进行退火后的CZT单晶片,晶片的电阻率有一定的提高,红外透过率有一定改善。XRD分析表明,经过退火后,CZT单晶片中的Cd组分含量有一定增加。采用该方法退火后,晶体品质有一定提高。Abstract: A new annealing equipment and processing of Cd1-xZnxTe wafers for detectors was reported.The CZT wafers enclosed with a Cd-riched CZT powder source was annealed in the equipment at appropriate annealing temperature and time.After annealing,the resistivity of the CZT wafer is increased and the IR transmittance is improved.XRD analysis shows that the Cd precipitate increases,Cd can be diffused in the crystal by this method.The homogeneity of the CZT wafers was improved by annealing.
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