Abstract: A method to prepare the Si inverse Opal structure embedded in Si flute by PECVD was explored.The results indicate that low RF power,low flow rate or high pressure in reaction chamber can decease the reaction rate,which is helpful to the sediment to be evenly.When the reaction rate is low enough and the channels for transfer of is not plugged up,compact inverse Opal can be obtained with prolonging sediment time.The orderly Opal structure is also important in this method.