Si衬底GaN基LED理想因子的研究

Research on the ideality factor of GaN light-emitting diodes on Si substrate

  • 摘要: 首次报道Si衬底GaN LED的理想因子。通过GaN LEDI-V曲线与其外延膜结晶性能相比较,发现理想因子的大小与X射线双晶衍射摇摆曲线(102)面半峰宽有着对应关系:室温时Si衬底GaN LED的理想因子为6.6,对应着半峰宽707arcsec;理想因子为4.5时,对应半峰宽530arcsec。蓝宝石衬底GaN LED理想因子为3.0,其对应半峰宽401arcsec。硅衬底GaN LED理想因子大的原因可以归结为高缺陷密度所致,高缺陷密度使电流隧穿更容易进行。

     

    Abstract: The ideality factor of GaN LED on Si substrate was studied.By studying the relation between I-V characteristics of different samples and their crystal properties,which were characterized by the full-width at half-maximum(FWHM)of the Δω-rocking curve for GaN(102) double crystal X-ray diffraction peak,it is found that there is direct relation between the ideality factor and the crystal property: the ideality factors for the three samples are 6.6,4.5,3.0,respectively,which are corresponding to the(102) DCXRD FWHM of each sample : 707,530,401,respectively.The anomalously high ideality factors(n≥2.0) are contributed to the high defect density,which makes tunneling current take place more easily.

     

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