Si作过渡层的Co/Cu/Co三明治膜中高灵敏度巨磁电阻效应和平面内磁各向异性

HIGH SENSITIVE GIANT MAGNETORESISTANCE AND IN-PLANE MAGNETIC ANISOTROPY IN Co/Cu/Co SANDWICHES WITH A Si BUFFER LAYER

  • 摘要: 用高真空电子束蒸发方法制备了以半导体材料Si为过渡层的Co/Cu/Co三明治膜并研究了其巨磁电阻效应。当Si过渡层厚度达到0.9nm时,三明治膜中开始出现较强的平面内磁各向异性。在Si 1.5nm/Co 5nm/Cu 3nm/Co 5nm结构中,在其易轴上得到了5.5%的巨磁电阻值和0.9%/Oe的高磁场灵敏度。研究了过渡层Si/Co界面之间的相互扩散,发现在过渡层Si与Co层间形成了Co-Si化合物。这个硅化物界面层诱导了三明治膜的平面内磁各向异性,从而导致了易轴上高灵敏度巨磁电阻效应。

     

    Abstract: The Co/Cu/Co sandwiches with an amorphous Si buffer layer were prepared by high vacuum electron-beam evaporation. The giant magnetoresistance (GMR) effect in these sandwiches was studied. It was found that an obvious in-plane magnetic anisotropy appeared in the Co/Cu/Co sandwiches with a Si buffer layer more than 0.9nm. A GMR of 5.5% and a high field sensitivity of 0.9%/Oe along the easy axis in Si 1.5nm/Co 5nm/Cu 3nm/Co 5nm sandwich was obtained. The interdiffusion at Si/Co interface was investigated and a cobalt silicide was found. The silicide layer formed at interface was thought to induce the in-plane magnetic anisotropy in the sandwiches, which consequently resulted in the high field sensitivity of GMR.

     

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