Abstract: Block copolymer thin films with controllable self-organized patterns were prepared by solvent-induced order-disorder transition method.The rate of solvent evaporating from thin solution-cast block copolymer films was controlled and used to manipulate the orientation of copolymer assemblies.With the decreasing of the solvent evaporation rate,the surface morphologies of the block copolymer films changed from disordered spherical pits to hexagonal spherical pits,hybrid morphology of spherical pits and in-plane cylinders,and finally to in-plane cylinders.A Closely-spaced nanoparticle array was fabricated with depositing gas-phase silver nanoclusters onto the as-prepared block copolymer template.