硼碳氮薄膜的脉冲激光沉积及其光学性能

Pulsed laser deposition and optical properties of BCN thin films

  • 摘要: 采用脉冲激光沉积技术,在Si(100)和石英基片上制备了硼碳氮薄膜(BCN)。利用X射线衍射(XRD),傅里叶变换红外光谱(FTIR)、X射线光电子能谱(XPS)和紫外-可见分光光度计对BCN薄膜进行了表征,研究了激光能量密度对BCN薄膜沉积速率、组分、结构和光学性能的影响。FTIR和XPS分析结果表明BCN薄膜中包含B-C,C-N和N-B化学键,说明实现了B、C和N的原子级化合。当激光能量密度从1 J/cm2增加到6 J/cm2时,BCN薄膜的沉积速率加快,N含量由7.2%增加到15%,光学禁带宽度(Eg)从4.02 eV降低到3.82 eV,Eg的降低主要与BCN薄膜中碳含量的增加有关。

     

    Abstract: Boron carbon nitride(BCN) thin films were deposited on Si(100) and quartz substrates by pulsed laser deposition.X-ray diffraction(XRD),Fourier-transform infrared(FTIR) spectroscopy,X-ray photoelectron spectroscopy(XPS) and ultraviolet-visible spectrophotometer were used to characterize the BCN thin films.The effects of the laser energy density on the film deposition rate,composition,structure and optical properties were investigated.FTIR and XPS analyses indicated the as-deposited BCN films contained B-C,N-C and B-N chemical bonds with B-C-N atomic hybridization.The film deposition rate increased with increasing laser energy density from 1 to 6 J/cm2.Meanwhile,the nitrogen content increased from 7.2 to 15 at.% and the optical band gap(Eg) decreased from 4.02 to 3.82 eV with increasing laser energy density.The behavior of Eg is mainly related to the increase of carbon content in the BCN thin films.

     

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