Abstract: Ni-Mn-Ga thin films were deposited by dc magnetron sputtering on NaCl substrates.The surface morphology,compositions and microstructures of the films were investigated and the magnetic-field-induced strain was measured.The results show that the films deposited on NaCl substrates have a surface with granules cluster of various sizes.A clear island structure of the films is observed,which indicates the films are formed by typical nuclear-growing mechanism.There is a partial amorphous state in the films before heat treatment. The heat treatment leads to polycrystalline state in the films.The freestanding thin films exhibit a recoverable shrink magnetic-field-induced strain of about-0.008% at the magnetic field of 1.3T.