银离子掺杂TiO2薄膜的物理性能研究

Physical and chemical characterizations of Ag doped titanium dioxide films

  • 摘要: 不同剂量的银离子被注入到采用反应磁控溅射(RMS)制备出的TiO2薄膜中。实验发现,薄膜的成分以二氧化钛和单质银为主,薄膜中可以看到银的纳米晶颗粒。注入的银离子在薄膜中呈近高斯分布,分布峰随注入剂量的增加而向表层移动。银离子注入后原本致密平整的TiO2薄膜表面出现了沟壑和晶粒粗化现象,且均方根粗糙度随注入剂量的增加而增加。不同的注入剂量对薄膜的表面能没有明显的影响。

     

    Abstract: Ag+ was implanted into titanium dioxide films that synthesized by reactive magnetron sputtering method.The investigation results show that main phases in the film are TiO2 and Ag,and Ag nano particles can be found.The depth profile distribution of Ag closes to Gauss Distribution,and its peak moves to the surface of the film with the increase of Ag doped dose.After Ag implantation,rough surface with bulky islands are observed instead of originally flat and dense surface,and the root mean squared(RMS)roughness of the film increases with implantation dose.However,different implantation dose has no significant influence on the surface energy of the films.

     

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