Abstract: High quality Mg_xZn_1-xO films were prepared by radio frequency magnetron sputtering ondifferent substrates. The structure and morphologies of the films were studied by X-ray diffraction （XRD） and atomic force microscopy （AFM）. The results indicate that Mg_xZn_1-xO films are hexagonal wurtzite structure, and they have a preferred orientation with the c axis perpendicular to the substrate. With the increasing of oxygen partial pressure, angle of （002） diffraction peak becomes larger and surface RMS of the films reduces. There are several UV and visible peaks in photoluminescence spectra,and 344nm luminescence is originated from band gap emission. The films have high transmittance invisible region, and the absorption edge of the films locates at 340nm. In addition, the band gap of Mg_xZn_1-xO films are estimated as 3.59eV.