射频反应溅射制备倾斜AlN薄膜
C-axis inclined AlN films prepared by RF reactive sputtering
-
摘要: 采用射频反应磁控溅射方法,通过旋转转盘,使衬底与靶材水平偏离一定角度,制备了C轴择优取向的倾斜AlN薄膜。用XRD分析了不同偏转角度下制备的AlN薄膜的择优取向度,用场发射扫描电镜(FE-SEM)观察了薄膜的截面形貌,并初步讨论了倾斜AlN薄膜的生长机理。分析和测试结果表明,当转盘旋转角度为10°时,AlN薄膜柱状晶倾斜最明显,倾斜角度可达25°。Abstract: C-axis inclined AIN films were prepared by rotating the turnplate with different angles in RF magnetic sputtering system.The Crystalline orientation and structure of the AlN films were investigated by X-ray diffraction,the cross-section of the inclined AlN films was observed by field emission scanning electron microscopy.The results show that AlN films exhibit inclined columnar structure up to 25°with the rotating angle of 10°.The growth mechanism of C-axis.inclined AlN films was discussed in short.
下载: