Abstract: The purpose of this paper is to explore the fabricating technique of optical waveguide devices for a integrated-optic disk head. A Si substrate was thermally oxidized to grow the SiO₂ buffer layer.Then the glass wave-guiding layer and Si-N cladding layer were deposited on it by ion Beam Enhance Deposition and PCVD methods, respectively. The grating pattern was obtained by the Holographic Interfere Photoetching method and transferred to the Si-N layer by loll Beam Etching. The fabricated linear grating had the same period of 1μm. The blaze angle is about 22° and the first-order distraction efficiency amounts to 120%, noticeably showing the character of blazed grating. Although the guided lightwave can not be focused into a point in the free space, the waveguide grating can be used as a guided wave-in/out grating coupler.