纳米尺度的硅/锗/硅锗基器件中的弹道输运

Ballistic Transport in Nanoscale Si/Ge/SiGe-Based Devices

  • 摘要: 电荷载流子的输运特性是半导体物理与纳米电子器件研究的核心内容。在传统宏观器件中,迁移率(mobility)作为关键参数,用于表征载流子在电场作用下运动的难易程度,并主导器件的性能表现。然而,当器件尺寸缩小至与载流子平均自由程相当时,弹道输运(ballistic transport)效应逐渐显现。在此机制下,载流子几乎无散射地穿过沟道,导致基于迁移率的传统漂移-扩散模型不再适用。本综述系统阐述了迁移率与弹道输运的基本概念及其相互关系,重点探讨了在逼近物理极限的纳米尺度硅/锗/硅锗基器件中实现弹道输运的策略与精确表征方法,并分析了当前研究进展与未来面临的挑战。

     

    Abstract: The transport properties of charge carriers are fundamental to the investigation of semiconductor physics and nanoelectronic devices. In traditional macroscopic devices, mobility is a critical parameter that characterizes the movement of carriers under an electric field and significantly influences device performance. However, as device dimensions are reduced to scales comparable to the mean free path of carriers, the ballistic transport phenomenon becomes prominent. In this regime, carriers traverse the channel with minimal scattering, rendering the conventional mobility-based drift-diffusion model insufficient. This review seeks to provide a systematic explanation of the characterization techniques for both mobility and ballistic transport, while also analyzing recent advancements and future challenges in Si/Ge/SiGe-based devices.

     

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