Abstract: The new progress at the Silicon-On-Insulator (SOI) technology is reviewed, according to the analysis of the recent two SOI international conferences. Three techniques, SIMOX, Smart-cut and BESOI, become very successful and commercially in producing SOI material. SOI devices have been used in several market applications such as high temperature and radiation hard integrated circuits. Recently much attention has been paid to SOI technology, because the most prominent advantage of SOI circuits is its ability to realize low voltage/low power.