GaAs和AlGaAs掺碳MOVPE生长技术进展
PROGRESS OF CARBON DOPING OF GaAs AND GaAlAs GROWN BY METALORGANIC VAPOR PHASE EPITAXY
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摘要: C作为Ⅲ-Ⅴ族半导体中常用的p型掺杂剂, 由于它的掺杂浓度极限高和扩散系数低, 逐渐引起人们的关注, 并在许多应用中显示出潜力而有望代替常规的p型掺杂剂, 如Zn和Be。根据近期研究成果, 对采用MOVPE技术生长的掺C GaAs和AlGaAs性能研究中的若干方面给予了系统介绍和讨论。在此基础上对其应用作了总结, 并对今后工作提出了几点建议。Abstract: Being with high doping concentration and low diffusivity, carbon has emerged as an attractive and promising p-type dopant in Ⅲ-Ⅴ semiconductors, alternative to the conventional acceptors such as Zn and Be for many applications.In this paper, systematically summarizing recent achievements, several aspects of carbon doping and characteristics of carbon doped GaAs and GaAlAs grown by metalorganic vapor phase epitaxy (MOVPE) are discussed and at based on it the applications and further researches of carbon doping are suggested.
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