石英基片上(110)取向PLZT薄膜及其光学性能研究

(110) Oriented PLZT Thin Films on Quartz and Their Optical Properties

  • 摘要: 在低成本的石英玻璃衬底上制备高性能电光薄膜非常有吸引力。本文采用溅射方法,并结合Pb3O4气氛退火工艺,在ITO/石英玻璃衬底上制备锆钛酸铅镧(PLZT 8/65/35)薄膜。结果表明:在优化工艺条件下,薄膜为(110)方向择优生长,表面均方根粗糙度为3.1nm,可见光范围内透过率为81.3%,消光系数为0.003。这种表面光滑和高光学性能的PLZT薄膜在集成光学和光电子器件具有重要的应用潜力。

     

    Abstract: It is very attractive to grow electro-optical thin film on quartz substrate.In this paper, utilizing sputtering deposition and annealed in Pb3O4 atmosphere, Lead lanthanum zirconate titanate(PLZT 8/65/35) thin films were prepared on indium tin oxides(ITO)/quartz substrates.Results show that under the optimized conditions, the PLZT film is preferably(110) oriented and RMS roughness is as low as 3.1 nm.In the range of visible light, the average transmittance is 81.3%, the extinction coefficient is 0.003.The superior optical properties will be promising for integrated optical and photoelectric devices.

     

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