系统压强对微波等离子体化学气相沉积金刚石成核的影响

Influence of pressure on nucleation of diamond by microwave plasma enhanced chemical vapor deposition synthesis

摘要: 为了在氧化铝上制备(100)定向织构的金刚石薄膜，必须先提高金刚石的成核密度。在微波等离子体化学气相沉积（MPCVD）系统中，采用低压成核的方法，在氧化铝陶瓷上沉积出高成核密度的金刚石薄膜。扫描电镜显示其成核密度可达10⁸ cm^-2。在此基础上，沉积出（100）织构的金刚石薄膜。

Abstract: In order to grow diamond film on alumina ceramic, it is essential to control the diamond nucleation properly. Under gas pressure lower than that used for growth, the high density nucleation of diamond films on alumina was successfully achieved by microwave plasma-enhanced chemical vapor deposition (MPCVD). Observation of SEM demonstrated that the nuclear density could be as high as 10⁸/cm². Based on this,100-textured diamond film was successfully deposited on alumina ceramic.