热退火对低温分子束外延GaAs材料深中心的影响

Effects of thermally annealing on deep-levels of low temperature MBE GaAs

  • 摘要: 利用光致瞬态电流谱 (OpticalTransientCurrentSpectrumOTCS)研究了热退火对低温分子束外延GaAs材料深中心的影响。实验结果表明原生和退火的LT-GaAs中都存在三个主要的深中心LT1、LT2、LT3,退火后各峰的相对强度变化很大, 特别ILT1/ILT3 =C由退火前的C >>1到退火后C <<1, 退火温度越高, C值越小, 这主要归因于热退火过程中砷的集聚与沉淀致使与砷反位缺陷AsGa及砷间隙Asi相关的LT1能级浓度的下降, 反之, 与镓空位VGa 相关的LT3能级浓度上升。另外经 800 ℃, 10 min热退火后, 在LT2 峰处出现了负瞬态, 可能是由于高温退火条件下形成的大尺寸, 非共格砷沉淀与GaAs基体间的结构缺陷造成的。

     

    Abstract: The effects of thermally annealing on deep-levels of low temperature MBE GaAs have been investigated by Optical Transient Current Spectrum (OTCS). There were three main deep level peaks LT1, LT2, LT3 in the as-grown and annealed LT GaAs. The relative intensity of those peaks will change hugely after annealing. Gather and precipitation of arsenic by thermally annealing will decrease arsenic anti-site defects AsGa and arsenic interstitial atom concentration that relative to LT1. In opposite, the LT3 that relative to vacancy VGa will increase.

     

/

返回文章
返回