YBCO外延薄膜的afterglow plasma溅射生长

YBCO thin film growth by afterglow plasma sputtering

摘要: Y₁Ba₂Cu₃O_7-δ(YBCO)高温超导薄膜溅射生长所遇到的主要问题是负氧离子的反溅射效应。采用afterglow plasma溅射生长YBCO薄膜,有效地抑制了负氧离子的反溅射效应,从而生长出了超导性质优异的YBCO单晶薄膜,薄膜的临界电流密度J_C(77 K,0 T)=7.6×10⁶ A/cm²,薄膜的微波表面电阻R_s(77 K,10 GHz)=206 μΩ,薄膜(005)峰摇摆曲线半高宽(FWHM)为0.12⁰。

Abstract: The key problem encountered in YBCO thin film growth by sputtering is the negative ions bombarding the growing films.To minimize the negative ions bombardment effect,YBCO thin film growth was experimented by afterglow plasma process.Single crystal YBCO thin films with excellent superconducting transition properties were prepared by afterglow plasma sputtering.The current density of the films at 77 K is 7.6×10⁶ A/cm²for 1 μV.The microwave surface resistance of the films at (77 K,10 GHz) is 206 μΩ.The full width at half maximum (FWHM) value of the rocking curve around (005) diffraction peak,which is 0.12^o,is obtained.